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Combustion synthesized indium-tin-oxide (ITO) thin film for source/drain electrodes in all solution-processed oxide thin-film transistors

机译:用于所有溶液处理的氧化物薄膜晶体管中的源/漏电极的燃烧合成铟锡氧化物(ITO)薄膜

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摘要

We report combustion solution synthesized (SCS) indium-tin-oxide (ITO) thin film, which is a well-known transparent conductive oxide, for source/drain (S/D) electrodes in solution-processed amorphous zirconium-indium-zinc-oxide TFT. A redox-based combustion synthetic approach is applied to ITO thin film using acety-lacetone as a fuel and metal nitrate as oxidizer. The structural and electrical properties of SCS-ITO precursor solution and thin films were systematically investigated with changes in tin concentration, indium metal precursors, and annealing conditions such as temperature, time, and ambient. It was found that at optimal conditions the SCS-ITO thin film exhibited high crystalline quality, atomically smooth surface (RMS ~ 4.1 A), and low electrical resistivity (4.2 × 10~(-4) Ω cm). The TFT using SCS-ITO film as the S/D electrodes showed excellent electrical properties with negligible hysteresis. The obtained "on/off" current ratio, subthreshold swing factor, subthreshold voltage, and field-effect mobility were 5 × 10~7, 0.43 V/decade, 0.7 V, and 2.1 cm~2/V s, respectively. The performance and stability of the SCS-ITO TFT are comparable to those of the sputtered-ITO TFT, emphasizing that the SCS-ITO film is a promising candidate for totally solution-processed oxide TFTs.
机译:我们报告了燃烧溶液合成(SCS)铟锡氧化物(ITO)薄膜,这是一种众所周知的透明导电氧化物,用于溶液处理的非晶锆-铟-锌-锌合金中的源/漏(S / D)电极氧化物TFT。基于氧化还原的燃烧合成方法被应用于使用乙缩醛丙酮作为燃料和金属硝酸盐作为氧化剂的ITO薄膜。通过锡浓度,铟金属前体和退火条件(例如温度,时间和环境)的变化,系统地研究了SCS-ITO前体溶液和薄膜的结构和电性能。结果发现,在最佳条件下,SCS-ITO薄膜具有较高的结晶质量,原子表面光滑(RMS〜4.1 A)和低电阻率(4.2×10〜(-4)Ωcm)。使用SCS-ITO膜作为S / D电极的TFT表现出优异的电性能,而滞后可以忽略不计。所获得的“开/关”电流比,亚阈值摆幅因子,亚阈值电压和场效应迁移率分别为5×10〜7、0.43 V /十倍,0.7 V和2.1 cm〜2 / V s。 SCS-ITO TFT的性能和稳定性可与溅射式ITO TFT的性能和稳定性相媲美,强调了SCS-ITO膜是完全固溶处理的氧化物TFT的有希望的候选者。

著录项

  • 来源
    《Applied Physics》 |2016年第6期|623.1-623.8|共8页
  • 作者单位

    School of Materials Science, Japan Advanced Institute of Science and Technology, Nomi, Ishikawa 923-1292, Japan,Core Research for Evolution Science and Technology (CREST), Japan Science and Technology Agency, Kawaguchi, Saitama 332-0012, Japan,ERATO Shimoda Nano-Liquid Process Project, Japan Science and Technology Agency, Nomi, Ishikawa 923-1292, Japan;

    Green Devices Research Center, Japan Advanced Institute of Science and Technology, Nomi, Ishikawa 923-1292, Japan,ERATO Shimoda Nano-Liquid Process Project, Japan Science and Technology Agency, Nomi, Ishikawa 923-1292, Japan;

    School of Materials Science, Japan Advanced Institute of Science and Technology, Nomi, Ishikawa 923-1292, Japan,Core Research for Evolution Science and Technology (CREST), Japan Science and Technology Agency, Kawaguchi, Saitama 332-0012, Japan;

    School of Materials Science, Japan Advanced Institute of Science and Technology, Nomi, Ishikawa 923-1292, Japan,Green Devices Research Center, Japan Advanced Institute of Science and Technology, Nomi, Ishikawa 923-1292, Japan,ERATO Shimoda Nano-Liquid Process Project, Japan Science and Technology Agency, Nomi, Ishikawa 923-1292, Japan;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
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  • 正文语种 eng
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