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Polarity driven simultaneous growth of free-standing and lateral GaAsP epitaxial nanowires on GaAs (001) substrate

机译:极性驱动GaAs(001)衬底上独立和横向GaAsP外延纳米线的同时生长

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摘要

Simultaneous growth of 〈111〉B free-standing and ±[110] lateral GaAsP epitaxial nanowires on GaAs (001) substrates were observed and investigated by electron microscopy and crystallographic analysis. It was found that the growth of both free-standing and lateral ternary nanowires via Au catalysts was driven by the fact that Au catalysts prefer to maintain low-energy {111}B interfaces with surrounding GaAs(P) materials: in the case of free-standing nanowires, Au catalysts maintain {111}B interfaces with their underlying GaAsP nanowires; while in the case of lateral nanowires, each Au catalyst remain their side {111}B interfaces with the surrounding GaAs(P) material during the lateral nanowire growth.
机译:在电子显微镜和晶体学分析中观察并研究了〈111〉B自立式和±[110]横向GaAsP外延纳米线在GaAs(001)衬底上的同时生长。发现通过Au催化剂生长自立和横向三元纳米线均受以下事实驱动:Au催化剂更喜欢与周围的GaAs(P)材料保持低能{111} B界面:在自由的情况下作为纳米线,Au催化剂与其下面的GaAsP纳米线保持{111} B界面;而在横向纳米线的情况下,在横向纳米线生长期间,每个Au催化剂都保持其侧面{111} B与周围的GaAs(P)材料接触。

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  • 来源
    《Applied Physics Letters 》 |2013年第22期| 1-4| 共4页
  • 作者单位

    Materials Engineering, The University of Queensland, St Lucia QLD 40732, Australia|c|;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
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