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首页> 外文期刊>Applied Physics Letters >β-Ga_2O_3 hetero-junction barrier Schottky diode with reverse leakage current modulation and BV~2/R_(on,sp) value of 0.93 GW/cm~2
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β-Ga_2O_3 hetero-junction barrier Schottky diode with reverse leakage current modulation and BV~2/R_(on,sp) value of 0.93 GW/cm~2

机译:β-GA_2O_3杂交连接屏障肖特基二极管,反向漏电流调制和BV〜2 / R_(上,SP)值0.93 gw / cm〜2

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摘要

In this paper, we show that high-performance β-Ga_2O_3 hetero-junction barrier Schottky (HJBS) diodes with various β-Ga_2O_3 periodic fin widths of 1.5/3/5 μm are demonstrated with the incorporation of p-type NiO_x. The β-Ga_2O_3 HJBS diode achieves a low specific on-resistance (R_(on,sp) of 1.94 mΩ cm~2 with a breakdown voltage of 1.34 kV at a β-Ga_2O_3 periodic fin width of 3 μm, translating to a direct-current Baliga's power figure of merit (PFOM) of 0.93 GW/cm~2. In addition, we find that by shrinking the β-Ga_2O_3 width, the reverse leakage current is minimized due to the enhanced sidewall depletion effect from p-type NiO_x. β-Ga_2O_3 HJBS diodes with p-type NiO_x turn out to be an effective route for Ga_2O_3 power device technology by considering the high PFOM while maintaining a suppressed reverse leakage current.
机译:在本文中,我们认为具有掺入p型NiO_x的高性能β-GA_2O_3杂交翼形屏障肖特基(HJBS)二极管1.5 / 3 /5μm的周期性翅片宽度。 β-GA_2O_3 HJBS二极管达到1.94mΩcm〜2的低特定导通电阻(R_(on,sp),β-ga_2o_3周期鳍片宽度为3μm的击穿电压为1.34kV,转换为直接 - 当前BALIGA的功率形式(PFOM)为0.93 GW / cm〜2。此外,我们发现通过收缩β-GA_2O_3宽度,由于P型NIO_X的增强型侧壁耗尽效果,反向漏电流最小化。 具有P型NIO_3的β-GA_2O_3 HJBS二极管通过考虑高PFOM而导致GA_2O_3功率器件技术的有效路径,同时保持抑制的反向漏电流。

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  • 来源
    《Applied Physics Letters》 |2021年第12期|122102.1-122102.5|共5页
  • 作者单位

    State Key Discipline Laboratory of Wide Band Gap Semiconductor Technology School of Microelectronics Xidian University Xi'an 710071 China;

    School of Electronic Science and Engineering Nanjing University Nanjing 210023 China;

    State Key Discipline Laboratory of Wide Band Gap Semiconductor Technology School of Microelectronics Xidian University Xi'an 710071 China;

    School of Electronic Science and Engineering Nanjing University Nanjing 210023 China;

    State Key Discipline Laboratory of Wide Band Gap Semiconductor Technology School of Microelectronics Xidian University Xi'an 710071 China;

    State Key Discipline Laboratory of Wide Band Gap Semiconductor Technology School of Microelectronics Xidian University Xi'an 710071 China;

    State Key Discipline Laboratory of Wide Band Gap Semiconductor Technology School of Microelectronics Xidian University Xi'an 710071 China;

    State Key Discipline Laboratory of Wide Band Gap Semiconductor Technology School of Microelectronics Xidian University Xi'an 710071 China;

    State Key Discipline Laboratory of Wide Band Gap Semiconductor Technology School of Microelectronics Xidian University Xi'an 710071 China;

    State Key Discipline Laboratory of Wide Band Gap Semiconductor Technology School of Microelectronics Xidian University Xi'an 710071 China;

    State Key Discipline Laboratory of Wide Band Gap Semiconductor Technology School of Microelectronics Xidian University Xi'an 710071 China;

    State Key Discipline Laboratory of Wide Band Gap Semiconductor Technology School of Microelectronics Xidian University Xi'an 710071 China;

    State Key Discipline Laboratory of Wide Band Gap Semiconductor Technology School of Microelectronics Xidian University Xi'an 710071 China;

    School of Electronic Science and Engineering Nanjing University Nanjing 210023 China;

    State Key Discipline Laboratory of Wide Band Gap Semiconductor Technology School of Microelectronics Xidian University Xi'an 710071 China;

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  • 原文格式 PDF
  • 正文语种 eng
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