首页> 外文会议>Electrochemical Society;Symposium on Wide-Bandgap Semiconductor Materials and Device;International Meeting on Chemical Sensors >Mechanism of Reverse Leakage Current in Schottky Diode Fabricated on Large Bandgap Semiconductors like Ga_2O_3 or Diamond
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Mechanism of Reverse Leakage Current in Schottky Diode Fabricated on Large Bandgap Semiconductors like Ga_2O_3 or Diamond

机译:在GA_2O_3或钻石等大带隙半导体上制造的肖特基二极管反向漏电流的机制

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One possible mechanism of reverse leakage current in Schottky diodes fabricated on large bandgap semiconductors like Ga_2O_3 or diamond is Schottky emission (image force barrier lowering) at the metal-semiconductor interface. Historically, there were 2 theories regarding the image force barrier lowering effect. The author's new idea is that the older and almost forgotten Kromer's theory can frequently give a much better fit to experimental data for large bandgap semiconductors like Ga203 or diamond Schottky diodes. It is possible to define an effective dielectric constant K_(eff) in the reverse leakage current equation and quite frequently 1 ≥ K_(eff) ≥ 1/4 for some large bandgap semiconductors like Ga203 or diamond. With proper peripheral surface passivation, K_(eff) can be equal to 1.
机译:在Ga_2O_3或金刚石上的大带隙半导体上制造的肖特基二极管中的反向漏电流的一种可能机制是金属半导体界面处的肖特基发射(图像力屏障降低)。 从历史上看,有2个有关图像力障碍降低效果的理论。 作者的新想法是,年龄较大的和几乎被遗忘的克洛姆勒的理论可以频繁地给予大型带隙半导体的实验数据,如GA203或钻石肖特基二极管。 对于一些大的带隙半导体,可以在反向漏电流方程中定义反向泄漏电流方程中的有效介电常数K_(EFF),并且非常频繁地为GA203或钻石等大的带隙半导体。 具有适当的外围表面钝化,K_(EFF)可以等于1。

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