首页> 外文期刊>Applied Physics Letters >Enhanced tunable and pyroelectric properties of Ba(Ti0.85Sn0.15)O3 thin films with Bi1.5Zn1.0Nb1.5O7 buffer layers
【24h】

Enhanced tunable and pyroelectric properties of Ba(Ti0.85Sn0.15)O3 thin films with Bi1.5Zn1.0Nb1.5O7 buffer layers

机译:具有Bi1.5Zn1.0Nb1.5O7缓冲层的Ba(Ti0.85Sn0.15)O3薄膜的可调谐和热释电性能增强

获取原文
获取原文并翻译 | 示例

摘要

Bi1.5Zn1.0Nb1.5O7 u0001BZNu0002 buffered Bau0001Ti0.85Sn0.15u0002O3 u0001BTSu0002 heterostructures have been deposited onnLaNiO3 /SiO2 /Si substrates by pulsed laser deposition. The film and interface microstructures,ndielectric and pyroelectric properties of BTS thin films are controlled by the thickness of the BZNnbuffer layer. The BZN layer suppresses interdiffusion between BTS and the bottom electrode,nresulting in a reduction in dielectric loss and leakage current. At 303 K, the dielectric loss, tunabilitynand figure of merit of BZN buffered-BTS films are 0.009, 47.9%, and 68.4, respectively.nFurthermore, a promising pyroelectric coefficient and figure of merit, 24.7u000110−4nC/m2nK andn16.3u000110−5nPa−1/2nare also attained at 293 K. © 2010 American Institute of Physics.
机译:Bi1.5Zn1.0Nb1.5O7 u0001BZNu0002缓冲的Bau0001Ti0.85Sn0.15u0002O3 u0001BTSu0002异质结构已通过脉冲激光沉积法沉积在nLaNiO3 / SiO2 / Si衬底上。 BTS薄膜的薄膜和界面微结构,介电和热电性质受BZNnbuffer层的厚度控制。 BZN层抑制了BTS与底部电极之间的相互扩散,从而降低了介电损耗和漏电流。在303 K时,BZN缓冲BTS膜的介电损耗,可调谐性和品质因数分别为0.009、47.9%和68.4。在293 K时也达到5nPa-1 / 2nare。©2010美国物理研究所。

著录项

  • 来源
    《Applied Physics Letters》 |2010年第8期|p.1-3|共3页
  • 作者单位

    Department of Mechanical Engineering, National University of Singapore, 9 Engineering Drive 1,Singapore 117576,2Department of Engineering Materials, University of Sheffield, Sheffield S1 3JD, United Kingdom;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号