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Low temperature scanning tunneling microscopy and spectroscopy on laterally grown In_xCa_(1-x)As nanowire devices

机译:低温扫描隧道显微镜和横向生长in_xca_(1-x)的光谱,作为纳米线器件

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摘要

Laterally grown In_xGa_(1-x)As nanowires (NWs) are promising candidates for radio frequency and quantum computing applications, which, however, can require atomic scale surface and interface control. This is challenging to obtain, not least due to ambient air exposure between fabrication steps, which induces surface oxidation. The geometric and electronic surface structures of In_xGa_(1-x)As NWs and contacts, which were grown directly in a planar configuration, exposed to air, and then subsequently cleaned using atomic hydrogen, are studied using low-temperature scanning tunneling microscopy and spectroscopy (STM/S). Atomically flat facets with a root mean square roughness of 0.12 nm and the InGaAs (001) 4 × 2 surface reconstruction are observed on the top facet of the NWs and the contacts. STS shows a surface bandgap variation of 30 meV from the middle to the end of the NWs, which is attributed to a compositional variation of the In/Ga element concentration. The well-defined facets and small bandgap variations found after area selective growth and atomic hydrogen cleaning are a good starting point for achieving high-quality interfaces during further processing.
机译:横向生长的in_xga_(1-x)作为纳米线(nws)是射频和量子计算应用的承诺候选者,但是,这可能需要原子尺度表面和界面控制。这是具有挑战性的,而不是由于制造步骤之间的环境空气暴露,这诱导表面氧化。使用低温扫描隧道显微镜和光谱研究了in_xga_(1-x)作为nws和触点的in_xga_(1-x)作为nws和触点直接生长,然后使用原子氢,然后使用原子氢清洁,然后使用原子氢清洁。 (STM / s)。具有0.12nm的根部均方粗糙度的原子平面和ingaAs(001)4×2表面重建在NWS和触点的顶部观察。 STS显示从NWS的中间到末端的30mev的表面带隙变化,其归因于IN / GA元件浓度的组成变化。区域选择性生长和原子氢清洁后发现的明确定义的刻面和小型带隙变化是在进一步加工过程中实现高质量接口的良好起点。

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  • 来源
    《Applied Physics Letters》 |2020年第16期|163101.1-163101.5|共5页
  • 作者单位

    Department of Physics Lund University 22100 Lund Sweden NanoLund Lund University 22100 Lund Sweden;

    NanoLund Lund University 22100 Lund Sweden Department of Electrical and Information Technology Lund University 22100 Lund Sweden;

    Department of Physics Lund University 22100 Lund Sweden NanoLund Lund University 22100 Lund Sweden;

    Department of Physics Lund University 22100 Lund Sweden NanoLund Lund University 22100 Lund Sweden;

    NanoLund Lund University 22100 Lund Sweden Department of Electrical and Information Technology Lund University 22100 Lund Sweden;

    NanoLund Lund University 22100 Lund Sweden Department of Electrical and Information Technology Lund University 22100 Lund Sweden;

    Department of Physics Lund University 22100 Lund Sweden NanoLund Lund University 22100 Lund Sweden;

    Department of Physics Lund University 22100 Lund Sweden NanoLund Lund University 22100 Lund Sweden;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
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  • 正文语种 eng
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