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High-spatial-resolution scanning capacitance microscope using all-metal probe with quartz tuning fork

机译:使用全金属探头和石英音叉的高分辨率扫描电容显微镜

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The scanning capacitance microscope (SCM) reported here uses a frequency modulation (FM) technique to control the distance between the sample and an all-metal probe. The probe was attached to a quartz tuning fork in a configuration minimizing the perturbation due to the probe. The FM-SCM yields two images of partial derivativeC/partial derivativeV and partial derivativeC/partial derivativeZ signals, where C is capacitance sensed by the probe, Z the probe-sample distance, and V a bias voltage, respectively. On a cross section of a field effect transistor, the two-dimensional p-n junction locus was observed with a spatial resolution better than 5 nm in the partial derivativeC/partial derivativeV image. The partial derivativeC/partial derivativeZ images of polysilicon gate electrodes and highly doped source/drain regions have higher contrast than the partial derivativeC/partial derivativeV images. (C) 2004 American Institute of Physics.
机译:此处报道的扫描电容显微镜(SCM)使用调频(FM)技术来控制样品与全金属探针之间的距离。探针以最小化探针引起的扰动的方式连接到石英音叉上。 FM-SCM产生两个图像,分别是偏导数C /偏导数V和偏导数C /偏导数Z信号,其中C是探头感测到的电容,Z是探头采样距离,而V是偏置电压。在场效应晶体管的截面上,在偏导数C /偏导数V图像中观察到二维p-n结轨迹,其空间分辨率优于5 nm。多晶硅栅电极和高掺杂源极/漏极区的偏导数C /偏导数Z图像具有比偏导数C /偏导数V图像更高的对比度。 (C)2004美国物理研究所。

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