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High-power characteristics of GaN/InGaN double heterojunction bipolar transistors

机译:GaN / InGaN双异质结双极晶体管的高功率特性

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摘要

High-power characteristics have been investigated for GaN/InGaN double heterojunction bipolar transistors (HBTs) on SiC substrates. A base-collector diode showed a high breakdown voltage exceeding 50 V, which is ascribed to a wide band gap of a GaN collector. The maximum collector current is proportional to the emitter size in the emitter-size ranging from 1.5×10~(-5) to 1.4×10~(-4) cm~(2). The corresponding maximum collector current density is as high as 6.7 kA/cm~(2), indicating the high current density characteristics of bipolar transistors. A 50 μm×30 μm device operated up to a collector-emitter voltage of 50 V and a collector current of 80 mA in its common-emitter current-voltage characteristics at room temperature. The corresponding power density is as high as 270 kW/cm~(2), showing that nitride HBTs are promising for high-power electronic devices in terms of both the material and the device structure.
机译:已经研究了SiC衬底上的GaN / InGaN双异质结双极晶体管(HBT)的高功率特性。基极-集电极二极管显示出超过50 V的高击穿电压,这归因于GaN集电极的宽带隙。最大集电极电流与发射体尺寸成正比,范围为1.5×10〜(-5)至1.4×10〜(-4)cm〜(2)。相应的最大集电极电流密度高达6.7 kA / cm〜(2),表明了双极晶体管的高电流密度特性。一个50μm×30μm的器件在室温下的共发射极电流-电压特性下可达到50 V的集电极-发射极电压和80 mA的集电极电流。相应的功率密度高达270 kW / cm〜(2),表明氮化物HBT在材料和器件结构方面都有望用于大功率电子器件。

著录项

  • 来源
    《Applied Physics Letters》 |2004年第11期|p.1964-1966|共3页
  • 作者单位

    NTT Basic Research Laboratories, NTT Corporation, 3-1 Morinosato Wakamiya, Atsugi-shi, Kanagawa 243-0198, Japan;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类 应用物理学;
  • 关键词

  • 入库时间 2022-08-18 03:23:13

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