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Spatial resolution of ballistic electron emission microscopy measured on metal/quantum-well Schottky contacts

机译:在金属/量子阱肖特基接触上测量的弹道电子发射显微镜的空间分辨率

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摘要

Au Schottky contacts on cleaved AlGaAs/GaAs/AlGaAs quantum wells (QWs) were used as precise nanometer-scale apertures to quantify the spatial resolution of ballistic electron emission microscopy (BEEM). Both the amplitude and width of the measured average BEEM current profiles showed systematic dependencies on the QW width and Au film thickness, indicating surprisingly large BEEM resolutions of ~12, ~16, and ~22 nm for Au film thicknesses of 4, 7, and 15 nm, respectively, but roughly independent of Au grain size. These measurements are consistent with theoretical models that include multiple hot-electron scattering at interfaces and in the bulk of the metal film.
机译:裂解的AlGaAs / GaAs / AlGaAs量子阱(QWs)上的Au肖特基接触被用作精确的纳米级孔径,以量化弹道电子发射显微镜(BEEM)的空间分辨率。测得的平均BEEM电流分布图的幅度和宽度都显示出对QW宽度和Au膜厚度的系统依赖性,这表明对于4、7和10的Au膜厚度,BEEM分辨率出乎意料的大,分别为〜12,〜16和〜22 nm。分别为15 nm,但大致与Au晶粒尺寸无关。这些测量结果与理论模型相一致,该理论模型包括在金属膜的界面和主体中发生多次热电子散射。

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