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首页> 外文期刊>Applied Physics Letters >Effect of multilayer barriers on the optical properties of GalnNAs single quantum-well structures grown by metalorganic vapor phase epitaxy
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Effect of multilayer barriers on the optical properties of GalnNAs single quantum-well structures grown by metalorganic vapor phase epitaxy

机译:多层势垒对金属有机气相外延生长的GalnNAs单量子阱结构光学性质的影响

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We report on the effects of combined strain-compensating and strain-mediating layers of various widths on the optical properties of 1.3 μm GaInNAs/GaAs single quantum well structures grown by metalorganic vapor phase epitaxy (MOVPE). While the emission wavelength of GaInNAs/GaAs quantum wells can be redshifted by the adoption of strain-compensated GaNAs layers, the material quality is degraded by the increased stress at the well/barrier interface. This detrimental effect can . be cured by inserting a strain-mediating InGaAs layer between them. Contrary to what is expected, however, the emission wavelength is blueshifted by the insertion of the InGaAs layer, which is attributed to the reduced N incorporation due to the improved interface quality. Our results indicate that the optical properties of MOVPE-grown GaInNAs/GaAs quantum wells can be optimized in quantum efficiency and emission wavelength by combination of strain-compensating and strain-mediating layers with suitable characteristics.
机译:我们报告了各种宽度的应变补偿和应变介导层的组合对通过金属有机气相外延(MOVPE)生长的1.3μmGaInNAs / GaAs单量子阱结构的光学性能的影响。尽管可以通过采用应变补偿式GaNAs层来使GaInNAs / GaAs量子阱的发射波长发生红移,但由于阱/势垒界面处应力的增加,材料质量会下降。这种有害的影响可以。通过在它们之间插入应变介质InGaAs层来固化。然而,与预期相反,通过插入InGaAs层,发射波长发生了蓝移,这归因于由于界面质量提高而减少的N掺入。我们的结果表明,通过结合具有适当特性的应变补偿层和应变介导层,可以在量子效率和发射波长上优化MOVPE生长的GaInNAs / GaAs量子阱的光学性质。

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