Photoluminescence Characteristics and Pit Formation of InGaN/GaN Quantum-Well Structures Grown on Sapphire Substrates by Low-Pressure Metalorganic Vapor Phase Epitaxy

摘要

We have examined how a growth interruption, caused by closing group-III sources, affects the crystalline quality of InGaN/GaN quantum-well (QW) structures grown by metalorganic vapor phase epitaxy. The QW samples were characterized by their photoluminescence (PL), and by atomic force microscopy (AFM), transmission electron microscopy (TEM), and energy dispersive x-ray (EDX) microanalysis. The PL peak wavelength was strongly dependent on the duration of the growth interruption and on the number of QW layers. AFM measurements revealed that the size of the open hexagonally shaped pits in the QW structures increased dramatically as the interruption duration was length- ened. Through TEM and EDX microanalysis, we found that the formation of these hexahedronal pits, formed due to the growth interruption, causes a large fluctuation in the In composition, especially around the pits, and the presence of such pits in an underlying QW layer strongly affects the In incorporation into the upper QW layers, leading to significant growth-rate variation in an InGaN QW layer and red-shifting of the PL spectra when a multiple-QW structure is grown.