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Study of the photoluminescence of phosphorus-doped p-type ZnO thin films grown by radio-frequency magnetron sputtering

机译:射频磁控溅射生长掺磷p型ZnO薄膜的光致发光研究

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Phosphorus-doped p-type ZnO thin films were grown on sapphire by radio-frequency magnetron sputtering. The photoluminescence (PL) spectra revealed an acceptor bound exciton peak at 3.355 eV and a conduction band to the acceptor transition caused by a phosphorus related level at 3.310 eV. A study of the dependence of the excitation laser power density and temperature on the characteristics of the PL spectra suggests that the emission lines at 3.310 and 3.241 eV can be attributed to a conduction band to the phosphorus-related acceptor transition and a donor to the acceptor pair transition, respectively. The acceptor energy level of the phosphorus dopant was estimated to be located 127 meV above the valence band.
机译:通过射频磁控溅射在蓝宝石上生长掺磷的p型ZnO薄膜。光致发光(PL)光谱显示在3.355 eV处有一个受主结合的激子峰,在3.310 eV处有一个与磷有关的能级引起的到受主跃迁的导带。对激发激光功率密度和温度对PL光谱特性的依赖性的研究表明,在3.310和3.241 eV处的发射线可归因于磷相关受体跃迁的导带以及受体的施主配对转换。估计磷掺杂剂的受体能级位于价带上方127 meV。

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