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Self-assembled monolayer cleaning methods: Towards fabrication of clean high-temperature superconductor nanostructures

机译:自组装单层清洁方法:致力于制造清洁的高温超导体纳米结构

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摘要

Although extensive amounts of research have been carried out on superconductor-normal metal-superconductor (SNS) electronic devices, the fabrication of superconductor SNS devices still remains difficult. Surface modification of high-temperature superconductors could be a way to control the interface of SNS electronic device fabrication. Here, we developed a cleaning method for thin films of high-temperature superconductor surface based on self-assembled monolayers. High-quality c-axis orientated YBa_2Cu_3O_(7-δ) (i.e., YBCO) and Y_(0.6)Ca_(0.4)Ba_(1.6)La_(0.4)Cu_3O_(7-δ) (i.e., TX-YBCO) thin films were deposited by standard laser ablation methods. YBCO/Au/YBCO and TX-YBCO/Au/TX-YBCO planar type junctions were fabricated by photolithography, focused-ion-beam milling, and ex situ sputter depositions. A 40-50 nm nanotrench was ion milled on the thin film by FIB, and a thin gold layer was deposited by an ex situ method on the nanotrench to connect the two separated high-temperature superconductor electrodes. SEM, AFM, and R vs T resistivity measurements were used to compare the corrosion layer formed in the interface of the SNS junctions with the SAM cleaned SNS junction. Evidence here suggests that the SAM cleaning method can be used to remove the degradation layer on the surface of cuprate superconductors. The obtained contact resistivity value, (10~(-8) Ω cm~2) for a SNS junction with SAM treatment is comparable with that of SNS junctions fabricated by the in situ methods.
机译:尽管已经对超导体普通金属超导体(SNS)电子设备进行了大量研究,但是制造超导体SNS器件仍然很困难。高温超导体的表面改性可能是控制SNS电子设备制造界面的一种方法。在这里,我们开发了一种基于自组装单层的高温超导体表面薄膜的清洁方法。高质量c轴取向的YBa_2Cu_3O_(7-δ)(即YBCO)和Y_(0.6)Ca_(0.4)Ba_(1.6)La_(0.4)Cu_3O_(7-δ)(即TX-YBCO)薄膜用标准的激光烧蚀方法沉积。 YBCO / Au / YBCO和TX-YBCO / Au / TX-YBCO平面型结是通过光刻,聚焦离子束铣削和非原位溅射沉积制成的。通过FIB在薄膜上离子铣削40-50 nm纳米沟槽,并通过异位沉积法在纳米沟槽上沉积金薄层,以连接两个分离的高温超导电极。使用SEM,AFM和R vs T电阻率测量来比较SNS结与SAM清洁的SNS结的界面中形成的腐蚀层。这里的证据表明,SAM清洁方法可用于去除铜酸盐超导体表面上的降解层。采用SAM处理的SNS结所获得的接触电阻率值(10〜(-8)Ωcm〜2)与通过原位方法制造的SNS结相当。

著录项

  • 来源
    《Applied Physics Letters》 |2005年第15期|p.154104.1-154104.3|共3页
  • 作者单位

    Department of Chemistry and Biochemistry, Center for Nano- and Molecular Science and Technology, The University of Texas at Austin, Austin, Texas 78712-1167;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类 应用物理学;
  • 关键词

  • 入库时间 2022-08-18 03:22:23

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