首页> 外文期刊>Applied Physics Letters >Demonstration and dynamic analysis of trapping of hot electrons at gate edge model for current collapse and gate lag in GaN-based highelectron-mobility transistor including self-heating effect
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Demonstration and dynamic analysis of trapping of hot electrons at gate edge model for current collapse and gate lag in GaN-based highelectron-mobility transistor including self-heating effect

机译:GaN基高电子迁移率晶体管中具有自热效应的电流崩解和栅极滞后在栅极边缘模型处捕获热电子的演示和动态分析

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Using a two-dimensional simulator, the authors report on demonstration of trapping of hot electrons at gate edge model in GaN-based high-electron-mobility transistors. Dynamic picture of hot electrons under gate pulse voltage is discussed in detail. Trapped charges may accumulate under punch-off gate voltage at gate edge drain side, where the electric field significantly changes and gate-voltage-dependent strain is induced. Significant band barrier is formed at the gate edges causing a notable current collapse. Self-heating effect is one of the reasons for current collapse and gate lag.
机译:作者使用二维模拟器报告了在基于GaN的高电子迁移率晶体管的栅极边缘模型处捕获热电子的演示。详细讨论了在栅极脉冲电压下热电子的动态图。被陷获的电荷可能会在栅极边缘漏极侧的击穿栅极电压下积累,在那里电场会发生显着变化,并会感应出与栅极电压相关的应变。在栅极边缘处形成明显的带阻,导致明显的电流崩溃。自热效应是电流崩溃和栅极滞后的原因之一。

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