首页> 外国专利> TRANSISTOR, AN INVERTER INCLUDING THE SAME AND A METHOD FOR MANUFACTURING THE TRANSISTOR AND THE INVERTER, INCLUDING A GATE INSULATION LAYER IN WHICH A CHARGE IS TRAPPED

TRANSISTOR, AN INVERTER INCLUDING THE SAME AND A METHOD FOR MANUFACTURING THE TRANSISTOR AND THE INVERTER, INCLUDING A GATE INSULATION LAYER IN WHICH A CHARGE IS TRAPPED

机译:晶体管,包括该晶体管的逆变器,以及制造晶体管和逆变器的方法,包括在电荷被捕获的情况下包含栅极绝缘层

摘要

PURPOSE: A transistor, an inverter including the same and a method for manufacturing the transistor and the inverter are provided to obtain an enhancement/depletion inverter with superior operational property using an oxide thin film transistor of which threshold voltage is increased.;CONSTITUTION: Gate electrodes(G1, G2) and channel layers(C1, C2) are spaced apart. Gate insulation layers(GI1, GI2) are arranged between the gate electrodes and the channel layers and include a charge trapping region. Source electrodes(S1, S2) and drain electrodes(D1, D2) are connected to both side of the channel layers. An electrical charge is trapped in the charge trapping region. A threshold voltage is transferred to a positive direction.;COPYRIGHT KIPO 2010
机译:目的:提供一种晶体管,包括该晶体管的反相器以及用于制造该晶体管的方法和该反相器,以使用阈值电压升高的氧化物薄膜晶体管来获得具有优异的操作性能的增强/耗尽型反相器。电极(G1,G2)和沟道层(C1,C2)间隔开。栅绝缘层(GI1,GI2)布置在栅电极和沟道层之间并且包括电荷俘获区。源电极(S1,S2)和漏电极(D1,D2)连接到沟道层的两侧。电荷被捕获在电荷捕获区域中。阈值电压向正方向转移。; COPYRIGHT KIPO 2010

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