Correlation between the atomic structures and the misorientation angles of [0001]-tilt grain boundaries at triple junctions in ZnO thin films grown on Si substrates

摘要

The correlation between the atomic structures and the misorientation angles of [0001]-tilt grain boundaries at triple junctions in ZnO thin films grown on Si substrates was investigated by using high-resolution transmission electron microscopy (HRTEM) measurements. The HRTEM images showed three symmetric grain boundaries and one asymmetric grain boundary around the triple junction in the ZnO film. The correlation between the atomic structures and the misorientation angles of the grain boundaries at triple junctions in ZnO films is described on the basis of the HRTEM results.