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首页> 外文期刊>Applied Physics Letters >Investigation of multilayer electronic vertically coupled InAs/GaAs quantum dot structures using surface photovoltage spectroscopy
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Investigation of multilayer electronic vertically coupled InAs/GaAs quantum dot structures using surface photovoltage spectroscopy

机译:表面光电压谱研究多层电子垂直耦合InAs / GaAs量子点结构

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摘要

Using room-temperature surface photovoltage spectroscopy, we have characterized several 30-layer stacked self-assembled InAs/GaAs quantum dot (QD) structures with different spacer layer (SL) thicknesses. Signals from every relevant portion of the samples, including QDs, wetting layer, and GaAs barrier have been observed. The strain-induced field for thinner SL is responsible for a significant modification of the band structure, possibly resulting in the appearance of an additional excited state lying higher than the second excited QD state. A peculiar feature below the fundamental transition is tentatively attributed to the optical absorption from uncoupled dots of which the density is significantly lower than that of vertically coupled ones. The spectra show blueshifted features with a decrease of the SL thickness, indicating that the materials intermixing between InAs QDs and GaAs SL are strongly driven by strain.
机译:使用室温表面光电压谱,我们已经表征了具有不同间隔层(SL)厚度的几个30层堆叠式自组装InAs / GaAs量子点(QD)结构。已观察到来自样品每个相关部分的信号,包括QD,润湿层和GaAs势垒。较薄SL的应变感应场负责明显改变能带结构,可能导致出现一个高于第二个受激QD状态的附加受激状态。暂时将低于基本过渡的特殊特征归因于来自未耦合点的光吸收,其密度显着低于垂直耦合点的密度。光谱显示出随SL厚度减小而蓝移的特征,表明InAs QD和GaAs SL之间的材料混合是受应变强烈驱动的。

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