首页> 外文期刊>Applied Physics Letters >Direct deposition of continuous metal nanostructures by thermal dip-pen nanolithography
【24h】

Direct deposition of continuous metal nanostructures by thermal dip-pen nanolithography

机译:通过热浸笔式纳米光刻技术直接沉积连续金属纳米结构

获取原文
获取原文并翻译 | 示例
           

摘要

We describe the deposition of continuous metal nanostructures onto glass and silicon using a heated atomic force microscope cantilever. Like a miniature soldering iron, the cantilever tip is coated with indium metal, which can be deposited onto a surface forming lines of a width less than 80 nm. Deposition is controlled using a heater integrated into the cantilever. When the cantilever is unheated, no metal is deposited from the tip, allowing the writing to be registered to existing features on the surface. We demonstrate direct-write circuit repair by writing an electrical connection between two metal electrodes separated by a submicron gap.
机译:我们描述了使用加热的原子力显微镜悬臂将连续的金属纳米结构沉积到玻璃和硅上。像微型烙铁一样,悬臂末端也涂有铟金属,该铟金属可以沉积到表面上,形成宽度小于80 nm的线。使用集成在悬臂中的加热器控制沉积。当悬臂不加热时,尖端不会沉积任何金属,从而使笔迹与表面上的现有特征对齐。我们通过在由亚微米间隙分隔的两个金属电极之间写入电连接来演示直接写入电路修复。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号