Characterization of the texture of silicide films using electron backscattered diffraction

摘要

Electron backscattered diffraction (EBSD) was used to characterize the texture of NiSi films. The various texture components (i.e., the types of preferred orientation, e.g., axiotaxy or epitaxy) could be identified, and their volume fraction could be quantified. Moreover, the spatial distribution of texture components could be studied in blanket films. Orientation imaging microscopy using EBSD is a promising technique to study the texture of silicide or germanide films both on blanket and patterned substrates.