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Electrical properties of ferroelectric BaTiO_3 thin film on SrTiO_3 buffered GaAs by laser molecular beam epitaxy

机译:激光分子束外延在SrTiO_3缓冲GaAs上的铁电BaTiO_3薄膜的电学性质

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摘要

Ferroelectric BaTiO_3 thin films were epitaxially grown on (001) GaAs substrate using SrTiO_3 as a buffer layer by laser molecular beam epitaxy. The perovskite SrTiO_3 buffer layer present a body centered cubic structure by formation of an interfacial layer with the [100]SrTiO_3||[110]GaAs in-plane relationship. Thereupon, a highly c-oriented BaTiO_3 thin film was grown on SrTiO_3/GaAs in a layer by layer mode. Enhanced electrical properties of the heteroepitaxial structure were demonstrated. The BaTiO_3(150 nm)/SrTiO_3/GaAs system demonstrates hysteresis loops with a remnant polarization of 2.5 μC/cm~2 at 600 kV/cm and a small leakage current density of 2.9 × 10~(-7) A/cm~2 at 200 kV/cm.
机译:利用SrTiO_3作为缓冲层,通过激光分子束外延在(001)GaAs衬底上外延生长铁电BaTiO_3薄膜。钙钛矿SrTiO_3缓冲层通过形成具有[100] SrTiO_3 || [110] GaAs平面内关系的界面层而呈现出体心立方结构。于是,在SrTiO_3 / GaAs上逐层地生长了高度c取向的BaTiO_3薄膜。证实了异质外延结构的增强的电性能。 BaTiO_3(150 nm)/ SrTiO_3 / GaAs系统显示出磁滞回线,在600 kV / cm时残留极化为2.5μC/ cm〜2,漏电流密度为2.9×10〜(-7)A / cm〜2在200 kV / cm

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  • 来源
    《Applied Physicsletters》 |2009年第3期|78-80|共3页
  • 作者

    W. Huang; Z. P. Wu; J. H. Hao;

  • 作者单位

    Department of Applied Physics and Materials Research Centre, The Hong Kong Polytechnic University, Hong Kong, People's Republic of China;

    Department of Applied Physics and Materials Research Centre, The Hong Kong Polytechnic University, Hong Kong, People's Republic of China;

    Department of Applied Physics and Materials Research Centre, The Hong Kong Polytechnic University, Hong Kong, People's Republic of China;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
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