机译:褶皱的SiGe / SiGe纳米结构的辐射发射
Institute of Thermomechanics of ASCR, v. v. i., Dolejskova 5, 182 00 Prague, Czech Republic S. S. Kutateladze Institute of Thermophysics, Siberian Branch of Russian Academy of Sciences, 1 Acad. Lavrentyev Ave, 630090 Novosibirsk, Russia;
Center for Condensed Matter Sciences and Graduate Institute of Electronics Engineering, National Taiwan University, Taipei 106, Taiwan;
Department of Physics, University of Massachusetts Boston, Boston, Massachusetts 02125, USA;
Sensors Directorate, Air Force Research Laboratory, Hanscom AFB, Massachusetts 01731, USA;
机译:一维,二维和三维纳米结构中的Si / SiGe异质界面:对SiGe发光的影响
机译:SiGe-Mg2Si,SiGe-Fesi2的纳米结构Mg2Si,Fesi2,SiGe和纳米复合材料的热电性能比较
机译:皱纹的SiGe / SiGe纳米膜的潜在应用
机译:三维,二维和一维纳米结构中的Si / SiGe界面及其对SiGe发光的影响
机译:SiGe PMOS器件上的总电离剂量辐射效应和负偏置温度不稳定性
机译:拉曼光谱分析非均质SiGe纳米结构的组成
机译:一维,二维和三维纳米结构中的Si / SiGe异质界面:它们对SiGe发光的影响