机译:钴斜柱状薄膜的磁光特性
Department of Electrical Engineering and Nebraska Center for Materials and Nanoscience, University of Nebraska-Lincoln, Lincoln, Nebraska 68588-0511, USA;
Department of Electrical Engineering and Nebraska Center for Materials and Nanoscience, University of Nebraska-Lincoln, Lincoln, Nebraska 68588-0511, USA;
J. A. Woollam Co. Inc., 645 M Street, Suite 102 Lincoln, Nebraska 68508-2243, USA;
Department of Electrical Engineering and Nebraska Center for Materials and Nanoscience, University of Nebraska-Lincoln, Lincoln, Nebraska 68588-0511, USA;
Department of Electrical Engineering and Nebraska Center for Materials and Nanoscience, University of Nebraska-Lincoln, Lincoln, Nebraska 68588-0511, USA;
机译:退火和共形氧化铝钝化对钴斜柱状薄膜磁光性能的各向异性和磁滞的影响
机译:矢量磁光广义椭偏法测定坡莫合金斜柱状薄膜的各向异性磁光滞后
机译:钴-坡莫合金斜柱状异质结构薄膜的光学和结构性质
机译:钝化渗透合金倾斜柱状薄膜上的矢量磁光广义椭圆图案
机译:磁倾叠柱状异质结构薄膜上的矢量磁光广义椭圆图案
机译:Si-Au倾斜柱状异质结构薄膜中的可调谐等离子体共振
机译:钴倾斜柱状薄膜的磁光特性