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Silicon-compatible compound semiconductor tunneling field-effect transistor for high performance and low standby power operation

机译:硅兼容化合物半导体隧穿场效应晶体管,可实现高性能和低待机功耗

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摘要

In this study, we propose and characterize by simulation a silicon-compatible compound semiconductor tunneling field-effect transistor (TFET) based on germanium (Ge)/gallium arsenide (GaAs) heterojunction aiming the various integrated systems on silicon substrate. By introducing Ge as p~+ source and GaAs as the high-mobility channel and n~+ drain materials, we maximize on-state current (I_(on)) and minimize off-state current (I_(off)) to obtain a TFET for high performance and low standby power capabilities. The effects of physical parameters such as aluminum content, source-gate overlap length, and gate workfunction on device performance were examined thoroughly. Further, we evaluate its radio frequency performance and confirm that it shows superb current and power gain characteristics.
机译:在这项研究中,我们提出并通过仿真来表征基于锗(Ge)/砷化镓(GaAs)异质结的硅兼容化合物半导体隧穿场效应晶体管(TFET),其目标是硅衬底上的各种集成系统。通过引入Ge作为p〜+源和GaAs作为高迁移率沟道以及n〜+漏极材料,我们使导通电流(I_(on))最大化,并使截止态电流(I_(off))最小化,从而获得TFET具有高性能和低待机功耗功能。彻底检查了诸如铝含量,源极-栅极重叠长度和栅极功函数等物理参数对器件性能的影响。此外,我们评估了其射频性能,并确认它具有出色的电流和功率增益特性。

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  • 来源
    《Applied Physics Letters》 |2011年第24期|p.243505.1-243505.4|共4页
  • 作者单位

    Department of Electrical Engineering, Stanford University, Stanford, California 94305-4075, USA;

    School of Electronics Engineering, Kyungpook National University, Daegu 702-701, Republic of Korea;

    Department of Electrical Engineering, Stanford University, Stanford, California 94305-4075, USA;

    Inter-university Semiconductor Research Center (ISRC) and Department of Electrical Engineering and Computer Science, Seoul National University, Seoul 151-742, Republic of Korea;

    Department of Electrical Engineering, Stanford University, Stanford, California 94305-4075, USA;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
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