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Epitaxial growth of Heusler alloy Co_2MnSi/MgO heterostructures on Ge(001) substrates

机译:Ge(001)衬底上Heusler合金Co_2MnSi / MgO异质结构的外延生长

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摘要

We prepared Heusler alloy Co_2MnSi/MgO heterostructures on single-crystal Ge(001) substrates through magnetron sputtering for Co_2MnSi and electron beam evaporation for MgO as a promising candidate for future generation spin-based functional devices. Structural investigations showed that the Co_2MnSi/MgO heterostructure was grown epitaxially on a Ge(001) substrate with extremely smooth and abrupt interfaces and showed the L2_1 structure for the Co_2MnSi film. Furthermore, a sufficiently high saturation magnetization (μ_s) value of 5.1 μ_B/f.u. at 10 K, which is close to the theoretically predicted μ_s of 5.0 μ_B/f.u. for half-metallic Co_2MnSi, was obtained for prepared Co_2MnSi films.
机译:通过磁控溅射Co_2MnSi和电子束蒸发MgO,我们在单晶Ge(001)衬底上制备了Heusler合金Co_2MnSi / MgO异质结构,作为下一代自旋基功能器件的有希望的候选者。结构研究表明,Co_2MnSi / MgO异质结构外延生长在具有极其光滑和突变界面的Ge(001)衬底上,并显示了Co_2MnSi膜的L2_1结构。此外,足够高的饱和磁化强度(μs)值为5.1μB/ f.u。在10 K时,这接近于理论预测的5.0μB/ f.u的μs。对于半金属Co_2MnSi,制备了Co_2MnSi薄膜。

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  • 来源
    《Applied Physics Letters》 |2011年第26期|p.262505.1-262505.3|共3页
  • 作者单位

    Divisiori of Electronics for Informatics, Hokkaido University, Sapporo 060-0814, Japan;

    Divisiori of Electronics for Informatics, Hokkaido University, Sapporo 060-0814, Japan;

    Divisiori of Electronics for Informatics, Hokkaido University, Sapporo 060-0814, Japan;

    Divisiori of Electronics for Informatics, Hokkaido University, Sapporo 060-0814, Japan;

    Divisiori of Electronics for Informatics, Hokkaido University, Sapporo 060-0814, Japan;

    Divisiori of Electronics for Informatics, Hokkaido University, Sapporo 060-0814, Japan;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
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  • 入库时间 2022-08-18 03:18:02

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