机译:Ge(001)衬底上Heusler合金Co_2MnSi / MgO异质结构的外延生长
Divisiori of Electronics for Informatics, Hokkaido University, Sapporo 060-0814, Japan;
Divisiori of Electronics for Informatics, Hokkaido University, Sapporo 060-0814, Japan;
Divisiori of Electronics for Informatics, Hokkaido University, Sapporo 060-0814, Japan;
Divisiori of Electronics for Informatics, Hokkaido University, Sapporo 060-0814, Japan;
Divisiori of Electronics for Informatics, Hokkaido University, Sapporo 060-0814, Japan;
Divisiori of Electronics for Informatics, Hokkaido University, Sapporo 060-0814, Japan;
机译:通过MgO中间层在Ge(001)衬底上外延生长Heusler合金Co_2MnSi薄膜
机译:磁控溅射在MgO(001)衬底上外延生长Co_2Cr_(0.6)Fe_(0.4)Al Heusler合金薄膜
机译:MgO缓冲MgO衬底上全Heusler合金Co $ _2 $ MnSi薄膜的外延生长
机译:通过MgO中间层在Ge(001)衬底上外延生长Heusler合金Co_2MnSi薄膜
机译:在锗(001)衬底上生长外延锗(1-y)碳(y)层期间的碳结合。
机译:MgO(001)衬底上的薄膜PdFe / VN和VN / PdFe双层薄膜的外延生长和超导性能
机译:Heusler合金Co2MnSi / MgO异质结构在Ge(001)衬底上的外延生长