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机译:在InGaN / GaN多量子阱发光碘化物中使用故意形成的V形凹坑来提高效率和电性能
LED Business, Samsung Electronics Co. Ltd., Giheung-gu, Yongin-si 446-711, South Korea;
LED Business, Samsung Electronics Co. Ltd., Giheung-gu, Yongin-si 446-711, South Korea;
LED Business, Samsung Electronics Co. Ltd., Giheung-gu, Yongin-si 446-711, South Korea;
LED Business, Samsung Electronics Co. Ltd., Giheung-gu, Yongin-si 446-711, South Korea;
LED Business, Samsung Electronics Co. Ltd., Giheung-gu, Yongin-si 446-711, South Korea;
LED Business, Samsung Electronics Co. Ltd., Giheung-gu, Yongin-si 446-711, South Korea;
LED Business, Samsung Electronics Co. Ltd., Giheung-gu, Yongin-si 446-711, South Korea;
LED Business, Samsung Electronics Co. Ltd., Giheung-gu, Yongin-si 446-711, South Korea;
机译:V形凹坑在InGaN / GaN多量子阱发光二极管中提高量子效率的作用
机译:V形凹坑在InGaN / GaN多量子阱发光二极管中提高量子效率的作用
机译:V型坑面积比对蓝色InGaN / GaN多量子阱发光二极管量子效率的影响
机译:V形凹坑密度对蓝色InGaN / GaN多量子阱发光二极管量子效率的影响:仿真
机译:InGaN / GaN多量子阱结构:亚微米结构,光学,电和化学性质。
机译:InGaN / GaN多量子阱LED纳米线中的载流子局部化效应:发光量子效率的提高和负热活化能
机译:IngaN / GaN多量子孔绿发光二极管内部量子效率改进