...
机译:V型坑面积比对蓝色InGaN / GaN多量子阱发光二极管量子效率的影响
National Institute of LED on Sillicon Substrate, Nanchang University, 235 Nan Jing East Road, Nanchang 330047, People's Republic of China;
National Institute of LED on Sillicon Substrate, Nanchang University, 235 Nan Jing East Road, Nanchang 330047, People's Republic of China;
National Institute of LED on Sillicon Substrate, Nanchang University, 235 Nan Jing East Road, Nanchang 330047, People's Republic of China;
National Institute of LED on Sillicon Substrate, Nanchang University, 235 Nan Jing East Road, Nanchang 330047, People's Republic of China;
National Institute of LED on Sillicon Substrate, Nanchang University, 235 Nan Jing East Road, Nanchang 330047, People's Republic of China;
InGaN/GaN multiple quantum well; Light-emitting diodes; V-shaped pits; Simulation;
机译:V形凹坑在InGaN / GaN多量子阱发光二极管中提高量子效率的作用
机译:V形凹坑在InGaN / GaN多量子阱发光二极管中提高量子效率的作用
机译:InGaN / GaN多量子阱中的内部极化场对蓝色发光二极管效率的影响
机译:V形凹坑密度对蓝色InGaN / GaN多量子阱发光二极管量子效率的影响:仿真
机译:以极性,半极性和非极性方向生长的InGaN / GaN多量子阱发光二极管。
机译:梯度铟成分p型InGaN层增强GaN基绿色发光二极管的量子效率
机译:具有AlGaN / GaN / AlGaN量子阱结构的电子阻挡层的蓝色InGaN / GaN发光二极管的优势