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Influence of dislocation density on carrier injection in InGaN/GaN light-emitting diodes operated with alternating current

机译:位错密度对交流电操作的InGaN / GaN发光二极管中载流子注入的影响

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摘要

The frequency dependence of current spreading and light output power (LOP) was investigated for InGaN/GaN light-emitting diodes (LEDs) grown on n-GaN templates with different threading dislocation densities (TDDs) that were operated using alternating-current (AC). By comparison with LEDs with low TDDs, the LEDs with high TDDs showed a strong frequency dependence for both current spreading and LOP during high-frequency AC operation. The results were attributed to a weak carrier injection into InGaN quantum wells (QWs) during high frequency AC operation, which resulted from the suppression of carrier transport induced by the carrier scattering around negatively charged dislocation cores.
机译:研究了在n GaN模板上生长的InGaN / GaN发光二极管(LED)的电流扩展和光输出功率(LOP)的频率依赖性,这些模板具有不同的穿线密度(TDD),并使用交流电(AC)进行操作。与具有低TDD的LED相比,具有高TDD的LED在高频AC操作期间对电流扩展和LOP都表现出很强的频率依赖性。该结果归因于在高频交流操作期间向InGaN量子阱(QWs)中注入的载流子较弱,这是由于载流子在带负电荷的位错核周围散射引起的载流子传输受到抑制所致。

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  • 来源
    《Applied Physics Letters》 |2013年第1期|11115.1-11115.4|共4页
  • 作者单位

    Chip Development Team (LED), Samsung Electronics, Yongin 446-711, South Korea;

    Chip Development Team (LED), Samsung Electronics, Yongin 446-711, South Korea;

    Chip Development Team (LED), Samsung Electronics, Yongin 446-711, South Korea;

    Chip Development Team (LED), Samsung Electronics, Yongin 446-711, South Korea;

    Chip Development Team (LED), Samsung Electronics, Yongin 446-711, South Korea;

    Chip Development Team (LED), Samsung Electronics, Yongin 446-711, South Korea;

    Chip Development Team (LED), Samsung Electronics, Yongin 446-711, South Korea;

    Department of Nano Systems Engineering, Center for Nano Manufacturing, lnje University,Gimhae 621-749, South Korea;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
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