机译:相变区二氧化钒薄膜的电流调制光学特性
School of Engineering and Applied Sciences, Harvard University, Cambridge, Massachusetts 02138, USA;
School of Engineering and Applied Sciences, Harvard University, Cambridge, Massachusetts 02138, USA;
School of Engineering and Applied Sciences, Harvard University, Cambridge, Massachusetts 02138, USA;
School of Engineering and Applied Sciences, Harvard University, Cambridge, Massachusetts 02138, USA;
School of Engineering and Applied Sciences, Harvard University, Cambridge, Massachusetts 02138, USA;
School of Engineering and Applied Sciences, Harvard University, Cambridge, Massachusetts 02138, USA;
School of Engineering and Applied Sciences, Harvard University, Cambridge, Massachusetts 02138, USA;
机译:相变区二氧化钒薄膜的电流调制光学特性
机译:掺杂Mo6 +的二氧化钒薄膜的光电开关特性及相变机理研究
机译:掺杂Mo6 + sup>的二氧化钒薄膜的光电转换特性及相变机理的研究
机译:ZnO缓冲层对二氧化钒薄膜相变特性的影响
机译:反应性蒸发的二氧化钒薄膜的光学性质和化学计量比(相变,缺陷,转换)。
机译:c面蓝宝石和二氧化钛上外延生长的二氧化钒薄膜的结构和光电性能
机译:二氧化钒(VO2)薄膜中的电场辅助金属绝缘体转变:光学转换行为和异常远红外发射率变化
机译:二氧化钒薄膜金属绝缘子转变的探索与优化