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Amorphous pnictide semiconductor BaZn_2As_2 exhibiting high hole mobility

机译:非晶态半导体BaZn_2As_2具有高空穴迁移率

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摘要

We selected BaZn_2As_2 as a candidate for a high-mobility p-type amorphous semiconductor because of the valence band maximum formed mainly of widely spread As 4p orbitals. The hole mobility of amorphous BaZn_2As_2 films increased from 1 to 10 cm~2 V~(-1) s~(-1) as the annealing temperature increased from 300 to 400 ℃. 500 ℃ annealing started crystallizing the film with the hole mobility ~20cm~2 V~(-1) s~(-1). The optical bandgaps of amorphous BaZn_2As_2 were 1.04-1.37 eV, which are much larger than that of the crystalline β-BaZn_2As_2 (0.23 eV). It is explained by the broken symmetry at the Ba site and the weakening of the As-As direct bonds, which is supported by 6 keV hard X-ray photoemission spectroscopy measurement.
机译:我们选择BaZn_2As_2作为高迁移率p型非晶半导体的候选材料,因为价带最大主要由广泛分布的As 4p轨道形成。随着退火温度从300℃升高到400℃,非晶态BaZn_2As_2薄膜的空穴迁移率从1 cm〜2 V〜(-1)s〜(-1)增加。 500℃退火使薄膜的空穴迁移率达到〜20cm〜2 V〜(-1)s〜(-1)。非晶态BaZn_2As_2的光学带隙为1.04-1.37 eV,比晶体β-BaZn_2As_2(0.23 eV)的大。这是由于Ba位置处对称性的破坏和As-As直接键的减弱所致,这是由6 keV硬X射线光电子能谱测量支持的。

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  • 来源
    《Applied Physics Letters》 |2016年第24期|242105.1-242105.4|共4页
  • 作者单位

    Materials and Structures Laboratory, Tokyo Institute of Technology, Yokohama 226-8503, Japan,Materials Research Center for Element Strategy, Tokyo Institute of Technology, Yokohama 226-8503, Japan;

    Materials and Structures Laboratory, Tokyo Institute of Technology, Yokohama 226-8503, Japan,Materials Research Center for Element Strategy, Tokyo Institute of Technology, Yokohama 226-8503, Japan;

    Materials Research Center for Element Strategy, Tokyo Institute of Technology, Yokohama 226-8503, Japan;

    Synchrotron X-ray Station at SPring-8, National Institute for Materials Science, Hyogo 679-5148, Japan,Quantum Beam Unit, National Institute for Materials Science, Tsukuba 305-0047, Japan;

    Materials and Structures Laboratory, Tokyo Institute of Technology, Yokohama 226-8503, Japan,Materials Research Center for Element Strategy, Tokyo Institute of Technology, Yokohama 226-8503, Japan;

    Materials and Structures Laboratory, Tokyo Institute of Technology, Yokohama 226-8503, Japan,Materials Research Center for Element Strategy, Tokyo Institute of Technology, Yokohama 226-8503, Japan;

    Materials and Structures Laboratory, Tokyo Institute of Technology, Yokohama 226-8503, Japan,Materials Research Center for Element Strategy, Tokyo Institute of Technology, Yokohama 226-8503, Japan;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
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  • 正文语种 eng
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  • 入库时间 2022-08-18 03:14:55

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