首页> 外文期刊>Applied Physics Letters >Low loss, high tunable BaZr_(0.2)Ti_(0.8)O_3/BaSn_(0.85)Ti_(0.15)O_3 heterostructure thin films
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Low loss, high tunable BaZr_(0.2)Ti_(0.8)O_3/BaSn_(0.85)Ti_(0.15)O_3 heterostructure thin films

机译:低损耗高可调BaZr_(0.2)Ti_(0.8)O_3 / BaSn_(0.85)Ti_(0.15)O_3异质结构薄膜

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摘要

Ferroelectric BaZr_(0.2)Ti_(0.8)O_3/BaSn_(0.85)Ti_(0.15)O_3 (BZT/BTS) heterostructure thin films (~200-nm-thick) have been prepared on Pt/TiO_x/SiO_2/Si substrates by pulsed laser deposition. The heterostructure thin films are crack free, compact, and crystallized in a perovskite structure. Dielectric measurements indicate that the BZT/BTS heterostructure thin films exhibit a low dielectric loss of below 0.007, a medium dielectric constant of ~441, and the superior tunable dielectric properties at room temperature. Calculations of tunability and figure of merit (FOM) display a maximum value of 68.5% at 500kV/cm and ~101, respectively. The FOM value is higher than that of the single-layer BTS and BZT thin films. A brief discussion is given on the lower loss compared to the single-layer thin films. The results indicate that BZT/BTS heterostructure thin films are excellent candidates for electrically steerable applications.
机译:在Pt / TiO_x / SiO_2 / Si衬底上通过脉冲法制备了铁电体BaZr_(0.2)Ti_(0.8)O_3 / BaSn_(0.85)Ti_(0.15)O_3(BZT / BTS)异质结构薄膜(约200nm厚)。激光沉积。异质结构薄膜无裂纹,致密并以钙钛矿结构结晶。介电测量表明,BZT / BTS异质结构薄膜的介电损耗低于0.007,介电常数约为441,在室温下具有优异的可调介电性能。在500kV / cm和〜101时,可调谐性和品质因数(FOM)的最大值分别显示为68.5%。 FOM值高于单层BTS和BZT薄膜的FOM值。简要讨论了与单层薄膜相比更低的损耗。结果表明,BZT / BTS异质结构薄膜是电气可控应用的极佳候选材料。

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  • 来源
    《Applied Physics Letters》 |2016年第14期|142905.1-142905.4|共4页
  • 作者单位

    School of Electronic and Information Engineering, Tianjin University, Tianjin 300072, People's Republic of China;

    Key Laboratory of Photovoltaic Materials of Henan Province and School of Physics and Electronics, Henan University, Kaifeng 475004, People's Republic of China;

    School of Electronic and Information Engineering, Tianjin University, Tianjin 300072, People's Republic of China;

    School of Electronic and Information Engineering, Tianjin University, Tianjin 300072, People's Republic of China;

    Key Laboratory of Photovoltaic Materials of Henan Province and School of Physics and Electronics, Henan University, Kaifeng 475004, People's Republic of China;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
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  • 正文语种 eng
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  • 入库时间 2022-08-18 03:14:51

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