Ge-doped GaSb thin films with zero mass density change upon crystallization for applications in phase change memories

摘要

In order to optimize materials for phase change random access memories (PCRAM), the effect of Ge doping on Ga-Sb alloy crystallization was studied using combined in situ synchrotron x-ray techniques, electrical measurements, and static laser testing. The present data emphasize that the crystallization temperature can be increased up to 390 ℃ with subsequent higher thermal stability of the amorphous phase; phase segregation is evidenced with GaSb, Sb, and Ge phases that crystallize in a two-step crystallization process. The Ge-doped GaSb films exhibit a larger electrical contrast as compared to undoped GaSb alloy (up to × 100). The optical contrast measured by laser testing is shown to follow the mass density change variations upon crystallization, with a negative contrast (higher value in amorphous state) whatever Ge-doping levels. In situ x-ray reflectivity measurements show that zero mass density change can be achieved by low Ge-doping. Ge-doped GaSb alloys look promising since a phase change material with zero mass density change and higher crystallization temperature satisfactorily fulfills the specifications for reliable PCRAM cells in terms of endurance and data retention.