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Defect quasi Fermi level control-based C_N reduction in GaN: Evidence for the role of minority carriers

机译:GaN中基于缺陷准费米能级控制的C_N降低:少数载流子作用的证据

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摘要

Compensating point defect reduction in wide bandgap semiconductors is possible by above bandgap illumination based defect quasi Fermi level (dQFL) control. The point defect control technique employs excess minority carriers that influence the dQFL of the compensator, increase the corresponding defect formation energy, and consequently are responsible for point defect reduction. Previous studies on various defects in GaN and AlGaN have shown good agreement with the theoretical model, but no direct evidence for the role of minority carriers was provided. In this work, we provide direct evidence for the role of minority carriers in reducing point defects by studying the predicted increase in work done against defect (C_N ~(-1)) formation with the decrease in the Fermi level (free carrier concentration) in Si doped GaN at a constant illumination intensity. Comparative defect photoluminescence measurements on illuminated and dark regions of GaN show an excellent quantitative agreement with the theory by exhibiting a greater reduction in yellow luminescence attributed to C_N ~(-1) at lower doping, thereby providing conclusive evidence for the role of the minority carriers in Fermi level control-based point defect reduction.
机译:通过上述基于带隙照明的缺陷准费米能级(dQFL)控制,可以减少宽带隙半导体中的补偿点缺陷。点缺陷控制技术采用了过多的少数载流子,这些载流子影响补偿器的dQFL,增加了相应的缺陷形成能量,因此导致了点缺陷的减少。先前对GaN和AlGaN中各种缺陷的研究表明与理论模型具有很好的一致性,但是没有提供直接证据证明少数载流子的作用。在这项工作中,我们通过研究随着铁氧体中费米能级(自由载流子浓度)的降低,针对缺陷(C_N〜(-1))形成的工作预计增加,为少数载子在减少点缺陷中的作用提供了直接的证据。硅以恒定的照明强度掺杂GaN。在GaN的亮区和暗区进行的比较缺陷光致发光测量显示出与该理论的极佳的定量一致性,因为在较低的掺杂量下,由于C_N〜(-1)引起的黄光发光显着降低,从而为少数载流子的作用提供了确凿的证据基于费米能级控制的点缺陷减少。

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  • 来源
    《Applied Physics Letters》 |2017年第15期|152101.1-152101.5|共5页
  • 作者单位

    Department of Materials Science and Engineering, North Carolina State University, Raleigh, NC, United States,Adroit Materials Inc., 2054 Kildaire Farm Rd., Cary, NC, United States;

    Department of Materials Science and Engineering, North Carolina State University, Raleigh, NC, United States;

    Adroit Materials Inc., 2054 Kildaire Farm Rd., Cary, NC, United States;

    Adroit Materials Inc., 2054 Kildaire Farm Rd., Cary, NC, United States;

    Adroit Materials Inc., 2054 Kildaire Farm Rd., Cary, NC, United States;

    Department of Materials Science and Engineering, North Carolina State University, Raleigh, NC, United States;

    Department of Materials Science and Engineering, North Carolina State University, Raleigh, NC, United States,Adroit Materials Inc., 2054 Kildaire Farm Rd., Cary, NC, United States;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
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