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Ultrafast bulk carrier recombination transients in n-type and semi-insulating 4H-SiC crystals

机译:n型和半绝缘4H-SiC晶体中超快的载流子复合瞬变

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摘要

Carrier recombination influences the performance of SiC-based optoelectronic devices, and carrier recombination via traps is one of the limiting factors of carrier lifetime. In this work, we utilized transient absorption spectroscopy with near-homogeneous carrier distribution to evaluate ultrafast bulk carrier recombination in conductive (n-type) nitrogen-doped and semi-insulating (SI) vanadium-doped 4H-SiC wafers. Compared to n-type 4H-SiC, a pronounced modulation of transient absorption was observed in SI 4H-SiC, resulting from an additional decay process subsequent to intraband recombination (2-3 ps) caused by carrier trapping of V3+/4+ deep acceptors. The carrier-trapping lifetime (similar to 16 ps) was three orders of magnitude faster than that via N-doping and/or inherent defects. With a simplified model and global analysis, the carrier recombination mechanisms and lifetimes in 4H-SiC were determined unambiguously. Published by AIP Publishing.
机译:载流子复合会影响SiC基光电器件的性能,而通过陷阱进行载流子复合是载流子寿命的限制因素之一。在这项工作中,我们利用载流子分布近乎均匀的瞬态吸收光谱技术,评估了导电(n型)掺杂氮和半绝缘(SI)掺杂钒的4H-SiC晶片中超快的载流子复合。与n型4H-SiC相比,在SI 4H-SiC中观察到明显的瞬态吸收调制,这是由V3 + / 4 +深受体的载流子俘获引起的带内重组(2-3 ps)之后的附加衰减过程导致的。载流子俘获寿命(约16 ps)比N掺杂和/或固有缺陷的俘获寿命快三个数量级。通过简化的模型和整体分析,可以明确确定4H-SiC中的载流子复合机理和寿命。由AIP Publishing发布。

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  • 来源
    《Applied Physics Letters》 |2018年第20期|201904.1-201904.5|共5页
  • 作者单位

    Suzhou Univ Sci & Technol, Sch Math & Phys, Jiangsu Key Lab Micro & Nano Heat Fluid Flow Tech, Suzhou 215009, Peoples R China;

    Suzhou Univ Sci & Technol, Sch Math & Phys, Jiangsu Key Lab Micro & Nano Heat Fluid Flow Tech, Suzhou 215009, Peoples R China;

    Soochow Univ, Coll Phys Optoelect & Energy, Suzhou 215006, Peoples R China;

    Suzhou Univ Sci & Technol, Sch Math & Phys, Jiangsu Key Lab Micro & Nano Heat Fluid Flow Tech, Suzhou 215009, Peoples R China;

    Suzhou Univ Sci & Technol, Sch Math & Phys, Jiangsu Key Lab Micro & Nano Heat Fluid Flow Tech, Suzhou 215009, Peoples R China;

    Suzhou Univ Sci & Technol, Sch Math & Phys, Jiangsu Key Lab Micro & Nano Heat Fluid Flow Tech, Suzhou 215009, Peoples R China;

    Soochow Univ, Coll Phys Optoelect & Energy, Suzhou 215006, Peoples R China;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
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  • 正文语种 eng
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