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Vanadium-doped molybdenum disulfide film-based strain sensors with high gauge factor

机译:钒掺杂的二硫化钼薄膜基应变片传感器

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This paper reports the piezoresistive performance of the two-dimensional (2D) material of vanadium (V)-doped molybdenum disulfide (MoS2) films based on sulfurization of sputtered Mo thin films. I-V characteristics indicate that V atom doping indeed decreases the resistivity of MoS2. Strain sensors based on V-doped MoS2 resistive elements were fabricated. By using a four-point bending method, a gauge factor (GF) of 140 under compressive and tensile strain conditions was obtained. The piezoresistive effect of V-doped MoS2 with different V sputtering conditions was also investigated. The doping method introducing V atoms as dopants is found to play an important role in enhancing piezoresistive performance. (C) 2019 The Japan Society of Applied Physics
机译:本文报道了基于溅射的Mo薄膜硫化的钒(V)掺杂的二硫化钼(MoS2)薄膜的二维(2D)材料的压阻性能。 I-V特性表明,V原子掺杂确实降低了MoS2的电阻率。制作了基于V掺杂MoS2电阻元件的应变传感器。通过使用四点弯曲方法,在压缩和拉伸应变条件下获得的规格系数(GF)为140。还研究了在不同的V溅射条件下V掺杂的MoS2的压阻效应。发现引入V原子作为掺杂剂的掺杂方法在增强压阻性能中起重要作用。 (C)2019日本应用物理学会

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  • 来源
    《Applied physics express》 |2019年第1期|015003.1-015003.5|共5页
  • 作者单位

    Tohoku Univ, Grad Sch Engn, Sendai, Miyagi 9808579, Japan;

    Tohoku Univ, Grad Sch Engn, Sendai, Miyagi 9808579, Japan;

    Tohoku Univ, Grad Sch Engn, Sendai, Miyagi 9808579, Japan;

    Tohoku Univ, Grad Sch Engn, Sendai, Miyagi 9808579, Japan;

    Tohoku Univ, Grad Sch Engn, Sendai, Miyagi 9808579, Japan;

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