首页> 外文期刊>Applied physics express >227 nm AIGaN Light-Emitting Diode with 0.15 mW Output Power Realized using a Thin Quantum Well and AIN Buffer with Reduced Threading Dislocation Density
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227 nm AIGaN Light-Emitting Diode with 0.15 mW Output Power Realized using a Thin Quantum Well and AIN Buffer with Reduced Threading Dislocation Density

机译:使用薄量子阱和AIN缓冲器实现了0.15 nm的输出功率的227 nm AIGaN发光二极管,具有降低的螺纹位错密度

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摘要

AIGaN multi-quantum-well (MQW) deep-ultraviolet (DUV) light-emitting diodes (LEDs) fabricated on sapphire substrates with emission at 227 nm are demonstrated. A remarkable enhancement in the DUV LED output power was achieved by using a thin AIGaN quantum well only 1.3 nm in thickness, with atomically flat hetero-interfaces, together with an AIN buffer layer of reduced threading dislocation density. The AIGaN-MQW DUV LEDs exhibited single emission peaks. The output power was 0.15 mW with injection current of 30 mA and the maximum external quantum efficiency was 0.2%, under room temperature pulsed operation.
机译:对在蓝宝石衬底上制造的227nm发射的AIGaN多量子阱(MQW)深紫外(DUV)发光二极管(LED)进行了演示。 DUV LED输出功率的显着提高是通过使用厚度仅为1.3 nm的薄AIGaN量子阱,原子平面的异质界面以及降低了螺纹位错密度的AIN缓冲层实现的。 AIGaN-MQW DUV LED表现出单个发射峰。在室温脉冲操作下,输出功率为0.15 mW,注入电流为30 mA,最大外部量子效率为0.2%。

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