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Formation of Si_2N_2O Microcrystalline Precipitates near the Quartz Crucible Wall Coated with Silicon Nitride in Cast-Grown Silicon

机译:铸造生长硅中涂覆氮化硅的石英坩埚壁附近Si_2N_2O微晶沉淀物的形成

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摘要

The chemical reaction near the crucible wall during directional solidification of Si crystals for solar cells has been investigated.Fragments of the crucible that were used for the crystal growth of a Si ingot were examined.As results, we found that a chemical reaction took place at the coating/ crucible interface and that silicon oxynitride particles precipitated near the crucible wall.The oxynitride precipitates were determined as stoichiometric Si_2N_2O and were revealed not to be amorphous but of orthorhombic crystal symmetry.We show crucial evidence of the formation of stoichiometric Si_2N_2O microcrystalline precipitates inside the Si crystal.
机译:研究了太阳能电池用硅晶体定向凝固过程中坩埚壁附近的化学反应,研究了用于硅锭晶体生长的坩埚碎片,结果发现发生了化学反应。氧氮化物的沉淀被确定为化学计量的Si_2N_2O并被证明不是非晶的,而是正交晶体的对称性。我们显示了内部形成化学计量的Si_2N_2O微晶沉淀的关键证据。硅晶体。

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  • 来源
    《_Applied Physics Express》 |2013年第8期|081303.1-081303.4|共4页
  • 作者单位

    Kanagawa Industrial Technology Center, Ebina, Kanagawa 243-0435, Japan,Meiji University, Kawasaki 214-8571, Japan;

    Kanagawa Industrial Technology Center, Ebina, Kanagawa 243-0435, Japan;

    Kanagawa Industrial Technology Center, Ebina, Kanagawa 243-0435, Japan,Meiji University, Kawasaki 214-8571, Japan,Mitsuba Corporation, Kiryu, Gunma 376-8555, Japan;

    Kanagawa Industrial Technology Center, Ebina, Kanagawa 243-0435, Japan,Meiji University, Kawasaki 214-8571, Japan;

    Kanagawa Industrial Technology Center, Ebina, Kanagawa 243-0435, Japan,Meiji University, Kawasaki 214-8571, Japan,Toyota Technical Institute, Nagoya 468-8511, Japan;

    Meiji University, Kawasaki 214-8571, Japan;

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