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First-principles calculations of a promising intermediate-band photovoltaic material based on Co-hyperdoped crystalline silicon

机译:基于Co-超掺杂晶体硅的有前途的中频光伏材料的第一性原理计算

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摘要

Among the various atomic structures of Co doped in the Si lattice, the substitutional Co is the most stable structure and can cause an impurity band in the band gap of crystalline Si. The impurity band is partially filled by electrons and isolated from the valence band (VB) and conduction band (CB), which fulfills the conditions of an intermediate-band (IB) photovoltaic material. The dielectric constant indicates that the substitutional Co-doped Si material can cause sub-band-gap light absorption. These properties will make the Co-hyperdoped Si a promising IB material in photovoltaic fields.
机译:在Si晶格中掺杂的Co的各种原子结构中,取代Co是最稳定的结构,并且可以在结晶Si的带隙中引起杂质带。杂质带被电子部分填充,并与价带(VB)和导带(CB)隔离,这满足了中带(IB)光伏材料的条件。介电常数表明,替代性的Co掺杂Si材料可引起子带隙光吸收。这些特性将使钴超掺杂硅成为光伏领域有希望的IB材料。

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  • 来源
    《Applied physics express》 |2015年第8期|081302.1-081302.4|共4页
  • 作者单位

    College of Physics and Electronic Engineering, Henan Normal University, 453007 Xinxiang, China,Henan Key Laboratory of Photovoltaic Materials, 453007 Xinxiang, China;

    College of Physics and Electronic Engineering, Henan Normal University, 453007 Xinxiang, China,Henan Key Laboratory of Photovoltaic Materials, 453007 Xinxiang, China;

    College of Physics and Electronic Engineering, Henan Normal University, 453007 Xinxiang, China,Henan Key Laboratory of Photovoltaic Materials, 453007 Xinxiang, China;

    College of Physics and Electronic Engineering, Henan Normal University, 453007 Xinxiang, China,Henan Key Laboratory of Photovoltaic Materials, 453007 Xinxiang, China;

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