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Analysis of High-Frequency Electromagnetic Scattering by Complex Targets Using Dual Flat Facet Representation

机译:双平面刻面分析复杂目标的高频电磁散射

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It is usually difficult to cater for multiple scattering and shadowing in the application of high-frequency asymptotic methods for electromagnetic (EM) scattering since this involves complicated geometrical computation. Efficient techniques with the use of dual flat representation of the target geometry are proposed to overcome this drawback. The dual facet representation is formed by a set of small triangular facets and an additional set of relatively large triangular facets. The set of smaller facets is used for the EM analysis so that approximation can be adopted to avoid the complicated geometrical computation associated with multiple scattering and shadowing, and the set of larger facets is applied for the computation of line/facet interaction and geometrical reflection to achieve computational efficiency. Numerical results are presented to demonstrate the validity and efficiency of the present technique, and the effect of the facet size on the solution accuracy is discussed.
机译:在电磁(EM)散射的高频渐近方法的应用中,通常难以应付多次散射和阴影,因为这涉及复杂的几何计算。提出了使用目标几何的双重平面表示的有效技术来克服该缺点。双重刻面表示法由一组小的三角形刻面和另一组相对较大的三角形刻面组成。较小的刻面集用于EM分析,因此可以采用近似值来避免与多重散射和阴影相关的复杂几何计算,而将较大的刻面集用于计算线/刻面交互作用和几何反射达到计算效率。数值结果表明了该技术的有效性和有效性,并讨论了刻面大小对求解精度的影响。

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