首页> 外文期刊>Advancing Microelectronics >Sapphire Surface Protection During Sapphire Micromachining and Through-Sapphire Via Formation for Device Densification, Backside Interconnect and Chip Stacking
【24h】

Sapphire Surface Protection During Sapphire Micromachining and Through-Sapphire Via Formation for Device Densification, Backside Interconnect and Chip Stacking

机译:蓝宝石微加工和贯穿蓝宝石的通孔形成过程中的蓝宝石表面保护,用于器件致密化,背面互连和芯片堆叠

获取原文
获取原文并翻译 | 示例

摘要

Through-vias in sapphire can aid in silicon-on-sapphire device densification and chip stacking. They can also help connect with electronic structures made on the back of the sapphire. Through-vias in sapphire can be formed using an appropriate laser. During the formation of through-vias in sapphire using a laser and during laser micromachining of sapphire, debris and heat-affected zones were produced. Various methods were evaluated to protect the circuitry on the sapphire from damage by debris and heat produced during laser application. Results of the evaluations are outlined and an effective method to help remove debris and reduce the effect of heat is described.
机译:蓝宝石中的通孔有助于蓝宝石上硅器件的致密化和芯片堆叠。它们还可以帮助与蓝宝石背面制成的电子结构连接。可以使用适当的激光形成蓝宝石中的通孔。在使用激光在蓝宝石中形成通孔的过程中,以及在对蓝宝石进行激光微加工的过程中,都会产生碎屑和热影响区。对各种方法进行了评估,以保护蓝宝石上的电路不受激光应用过程中产生的碎屑和热量损坏。概述了评估结果,并介绍了一种有助于清除碎屑并减少热量影响的有效方法。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号