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Synthesis of High-Density Indium Oxide Nanowires with Low Electrical Resistivity

机译:具有低电阻率的高密度氧化铟纳米线的合成

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摘要

In this study, indium oxide nanowires of high-density were synthesized by chemical vapor deposition (CVD) through a vapor–liquid–solid (VLS) mechanism without carrier gas. The indium oxide nanowires possess great morphology with an aspect ratio of over 400 and an average diameter of 50 nm; the length of the nanowires could be over 30 μm, confirmed by field-emission scanning electron microscopy (SEM). Characterization was conducted with X-ray diffraction (XRD), transmission electron microscopy (TEM), photoluminescence spectrum (PL). High-resolution TEM studies confirm that the grown nanowires were single crystalline c-In2O3 nanowires of body-centered cubic structures. The room temperature PL spectrum shows a strong peak around 2.22 eV, originating from the defects in the crystal structure. The electrical resistivity of a single indium oxide nanowire was measured to be 1.0 × 10−4 Ω⋅cm, relatively low as compared with previous works, which may result from the abundant oxygen vacancies in the nanowires, acting as unintentional doping.
机译:在该研究中,通过化学气相沉积(CVD)通过蒸汽 - 液 - 固体(VLS)机构而没有载气的氧化铟纳米线。氧化铟纳米线具有宽高的形态,纵横比为400多,平均直径为50nm;纳米线的长度可以超过30μm,通过现场排放扫描电子显微镜(SEM)确认。用X射线衍射(XRD),透射电子显微镜(TEM),光致发光光谱(PL)进行表征。高分辨率的TEM研究证实生长的纳米线是体为立方结构的单晶C-In2O3纳米线。室温PL光谱显示出左右2.22eV的强峰,来自晶体结构中的缺陷。单个氧化铟纳米线的电阻率测量为1.0×10-4Ω·℃,与先前的作品相对较低,这可能是由纳米线中的丰富氧空位导致的,作为无意的掺杂。

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