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Nitrogen-doped tungsten oxide nanowires: Low-temperature synthesis on Si, and electrical, optical, and field-emission properties

机译:氮掺杂氧化钨纳米线:Si的低温合成以及电,光和场发射特性

摘要

[[abstract]]Very dense and uniformly distributed nitrogen-doped tungsten oxide (WO3) nanowires were synthesized successfully on a 4-inch Si(100) wafer at low temperature. The nanowires were of lengths extending up to 5 mu m and diameters ranging from 25 to 35 nm. The highest aspect ratio was estimated to be about 200. An emission peak at 470 nm was found by photoluminescence measurement at room temperature. The suggested growth mechanism of the nanowires is vapor-solid growth, in which gaseous ammonia plays a significant role to reduce the formation temperature. The approach has proved to be a reliable way to produce nitrogen-doped WO3 nanowires on Si in large quantities. The direct fabrication of WO3-based nanodevices on Si has been demonstrated.
机译:[[摘要]]在4英寸Si(100)晶圆上低温成功地合成了非常致密且均匀分布的氮掺杂氧化钨(WO3)纳米线。纳米线的长度延伸至5μm,直径范围为25至35nm。最高纵横比估计约为200。在室温下通过光致发光测量发现在470 nm处有一个发射峰。纳米线的建议生长机理是气固生长,其中氨气在降低形成温度方面起着重要作用。实践证明,该方法是在Si上大量生产氮掺杂WO3纳米线的可靠方法。已经证明了在Si上直接制造基于WO3的纳米器件。

著录项

  • 作者

    Chang MT;

  • 作者单位
  • 年度 2011
  • 总页数
  • 原文格式 PDF
  • 正文语种 [[iso]]en
  • 中图分类
  • 入库时间 2022-08-20 20:07:31

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