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COMPOSING METHOD OF INDIUM REDUCTION COMPOSITION (INDIUM - ZINC-ANNOTATION OXIDE COMPOUND) NANO POWDER HAVING TIN AND ZINC USING CLEAN PROCESS TO MANUFACTURE HIGH INTENSITY INDIUM OXIDE TARGET WITH EXCELLENT ELECTRICAL PERFORMANCE AT LOW PLASTIC TEMPERATURE AND A MANUFACTURING METHOD OF HIGH INTENSITY AS WELL AS HIGH DENSITY TARGET
COMPOSING METHOD OF INDIUM REDUCTION COMPOSITION (INDIUM - ZINC-ANNOTATION OXIDE COMPOUND) NANO POWDER HAVING TIN AND ZINC USING CLEAN PROCESS TO MANUFACTURE HIGH INTENSITY INDIUM OXIDE TARGET WITH EXCELLENT ELECTRICAL PERFORMANCE AT LOW PLASTIC TEMPERATURE AND A MANUFACTURING METHOD OF HIGH INTENSITY AS WELL AS HIGH DENSITY TARGET
PURPOSE: A composing method of indium reduction oxide nano powder is provided to reduce the amount of indium by manufacturing indium oxide including zinc and tin, compose nano powder through clean process without generation of waste water, and control agglomeration phenomenon of nano powder composed by using dispersing agent.;CONSTITUTION: A composing method of indium reduction oxide nano powder comprises the following steps. (i) Indium hydroxide having zinc and tin is composed by injecting metal acetate into butanol. Indium oxide powder having zinc and tin as bixybyite single crystal phase is composed by calcining indium hydroxide having zinc and tin which are composed at 300°C. A manufacturing method of high intensity as well as high density target comprises the following steps. (a) A slurry is manufactured by mixing indium reduction oxide nano powder having zinc and tin with binder and release agent. (b) Target molding product is manufactured by spray-drying the slurry with granulation, and a first uni-axial molding and a second equivalence pressure molding. And (c) the molding product is plasticized for four hours in a pressurization oxygen atmosphere at 1350°C.;COPYRIGHT KIPO 2013
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