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Structural Optical and Electrical Properties of Al+MoO

机译:Al + Moo的结构光学和电气性质

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摘要

Structural, optical and electrical properties of Al+MoO3 and Au+MoO3 thin films prepared by simultaneous magnetron sputtering deposition were investigated. The influence of MoO3 sputtering power on the Al and Au nanoparticle formation and spatial distribution was explored. We demonstrated the formation of spatially arranged Au nanoparticles in the MoO3 matrix, while Al incorporates in the MoO3 matrix without nanoparticle formation. The dependence of the Au nanoparticle size and arrangement on the MoO3 sputtering power was established. The Al-based films show a decrease of overall absorption with an Al content increase, while the Au-based films have the opposite trend. The transport properties of the investigated films also are completely different. The resistivity of the Al-based films increases with the Al content, while it decreases with the Au content increase. The reason is a different transport mechanism that occurs in the films due to their different structural properties. The choice of the incorporated material (Al or Au) and its volume percentage in the MoO3 matrix enables the design of materials with desirable optical and electrical characteristics for a variety of applications.
机译:研究了通过同时磁控溅射沉积制备的Al + MOO3和Au + Moo3薄膜的结构,光学和电性能。探讨了MOO3溅射功率对Al和Au纳米粒子形成和空间分布的影响。我们证明了在MOO3基质中形成了空间排列的Au纳米颗粒,而Al在没有纳米颗粒形成的情况下纳入MOO3基质中。建立了Au纳米颗粒尺寸和布置对MOO3溅射功率的依赖性。基于Al的薄膜显示出含量含量的整体吸收降低,而Au基薄膜具有相反的趋势。调查薄膜的运输性质也完全不同。 Al基薄膜的电阻率随Al含量的增加,而它随着Au含量的增加而降低。原因是由于其不同的结构性,因此在薄膜中发生的不同传送机制。在MOO3矩阵中的掺入材料(Al或Au)的选择及其体积百分比使得能够为各种应用具有所需的光学和电气特性的材料。

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