首页> 外文期刊>Journal of Physics, D. Applied Physics: A Europhysics Journal >Electrical, photo-electrical, optical and structural properties of CdSe thin films deposited by thermal and e-beam techniques
【24h】

Electrical, photo-electrical, optical and structural properties of CdSe thin films deposited by thermal and e-beam techniques

机译:通过热和电子束技术沉积的CdSe薄膜的电,光电,光学和结构性质

获取原文
获取原文并翻译 | 示例
           

摘要

In this study, electrical, photo-electrical, optical and structural analyses of CdSe thin films deposited by thermal and e-beam evaporation techniques were carried out by measuring temperature dependent conductivity, mobility, photoconductivity under different illumination intensity, photoresponse, transmission and x-ray diffraction. As a result of these measurements, it was observed that the films deposited by the thermal evaporation technique have room temperature conductivity values approximately three orders of magnitude greater than the ones deposited by e-beam evaporation. Structural analysis showed that the films deposited by both methods with the same growth parameters have a mixed structure with the contribution of cubic and hexagonal structures. Two direct band gap values were obtained at 1.71 and 1.88 eV. Also, sublinear and supralinear photoconductivity behaviours related to sensitizing and imperfection levels lying at 0.12 and 0.28 eV below the conduction band were determined. The existence of these levels was clarified together with the valence band splitting by using photoresponse measurements.
机译:在这项研究中,通过测量与温度有关的电导率,迁移率,在不同照明强度下的光电导率,光响应,透射率和x-射线,对通过热和电子束蒸发技术沉积的CdSe薄膜进行电学,光电学,光学和结构分析。射线衍射。这些测量的结果是,观察到通过热蒸发技术沉积的膜的室温电导率值比通过电子束蒸发沉积的膜的电导率值大大约三个数量级。结构分析表明,用两种方法沉积的具有相同生长参数的薄膜具有立方和六边形结构的混合结构。在1.71和1.88 eV处获得两个直接带隙值。此外,确定了与在导带以下0.12和0.28 eV处的敏化和缺陷水平有关的亚线性和超线性光电导行为。这些水平的存在与使用光响应测量的价带分裂一起被阐明。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号