A low-energy plasma focus device was used as an electron beam source. A technique was developed to simultaneously measure the electron beam intensity and energy. The system was operated in Argon filling at an optimum pressure of 1.7 mbar. A Faraday cup was used together with an array of filtered PIN diodes. The beam-target X-rays were registered through X-ray spectrometry. Copper and lead line radiations were registered upon usage as targets. The maximum electron beam charge and density were estimated to be 0.31 μC and 13.5 × 1016/m3, respectively. The average energy of the electron beam was 500 keV. The high flux of the electron beam can be potentially applicable in material sciences.
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机译：低能等离子体聚焦装置用作电子束源。开发了一种可以同时测量电子束强度和能量的技术。该系统在1.7 mbar的最佳压力下以氩气充注操作。法拉第杯与一系列过滤后的PIN二极管一起使用。束目标X射线通过X射线光谱法记录。铜和铅线辐射在使用时被记录为目标。最大电子束电荷和密度估计分别为0.31μC和13.5×10 16 / m 3 。电子束的平均能量为500 keV。电子束的高通量可能会在材料科学中应用。
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