Nanoscale structural defects in oblique Ar+ sputtered Si(111) surfaces

摘要

The present endeavor investigates the controlled surface modifications and evolution of self-assembled nano-dimensional defects on oblique Ar⁺ sputtered Si(111) surfaces which are important substrates for surface reconstruction. The defect formation started at off-normal incidences of 50° and then deflates into defined defect zones with decrease in oblique incidence, depending strongly on angle of ion incidence. Interestingly, it is observed that mean size & height decreases while average density of these defects increases with decreasing oblique incidence. Non-linear response of roughness of irradiated Si(111) with respect to oblique incidence is observed. Crystalline (c-Si) to amorphous (a-Si) phase transition under oblique argon ion irradiation has been revealed by Raman spectroscopy. Our analysis, thus, shows that high dose argon ion irradiation generates of self-assembled nano-scale defects and surface vacancies & their possible clustering into extended defect zones. Explicitly, ion beam-stimulated mass transport inside the amorphous layers governs the observed defect evolution. This investigation of crystalline (c-Si) coupled with amorphous (a-Si) phases of nano-structured surfaces provides insight into the potential applications in the nano-electronic and optoelectronic devices thus, initiating a new era for fabricating multitude of novel structures.