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Ultra-long metal nanowire arrays on solid substrate with strong bonding

机译:具有牢固键合的固态衬底上的超长金属纳米线阵列

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摘要

Ultra-long metal nanowire arrays with large circular area up to 25 mm in diameter were obtained by direct electrodeposition on metalized Si and glass substrates via a template-based method. Nanowires with uniform length up to 30 μm were obtained. Combining this deposition process with lithography technology, micrometre-sized patterned metal nanowire array pads were successfully fabricated on a glass substrate. Good adhesion between the patterned nanowire array pads and the substrate was confirmed using scanning acoustic microscopy characterization. A pull-off tensile test showed strong bonding between the nanowires and the substrate. Conducting atomic force microscopy (C-AFM) measurements showed that approximately 95% of the nanowires were electrically connected with the substrate, demonstrating its viability to use as high-density interconnect.
机译:通过基于模板的方法直接在金属化的Si和玻璃基板上进行电沉积,可以获得直径高达25 mm的大圆形区域的超长金属纳米线阵列。得到具有均匀长度至多30μm的纳米线。将该沉积工艺与光刻技术相结合,可以在玻璃基板上成功制造出微米级的图案化金属纳米线阵列垫。使用扫描声学显微镜表征证实了图案化的纳米线阵列垫与基板之间的良好粘附。拉伸试验显示纳米线与基材之间的牢固结合。传导原子力显微镜(C-AFM)测量表明,大约95%的纳米线与基板电连接,这证明了其可用作高密度互连的可行性。

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