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Effects of Sn doping on the morphology and properties of Fe-doped In2O3 epitaxial films

机译:Sn掺杂对掺Fe的In2O3外延膜形貌和性能的影响

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摘要

(Sn, Fe)-codoped In2O3 epitaxial films were deposited on (111)-oriented Y-stabilized ZrO2 substrates by pulsed laser deposition with constant Fe concentration and different Sn concentrations. The influence of Sn concentration on the crystal structure and properties of Fe-doped In2O3 ferromagnetic semiconductor films has been investigated systematically. Experimental results indicate that Sn doping can effectively reduce the surface roughness and suppresses breakup of the films into separated islands. At the same time, the optical band gap increases and the electrical properties improve correspondingly. However, although the carrier density increases dramatically with the Sn doping, no obvious change of the ferromagnetism is observed. This is explained by a modified bounded magnetic polaron model.
机译:通过脉冲激光沉积以恒定的Fe浓度和不同的Sn浓度在(111)取向的Y稳定的ZrO2衬底上沉积(Sn,Fe)掺杂的In2O3外延膜。已经系统地研究了Sn浓度对掺Fe的In2O3铁磁半导体薄膜的晶体结构和性能的影响。实验结果表明,Sn掺杂可有效降低表面粗糙度,并抑制薄膜分裂成分离的岛。同时,光学带隙增加,电性能相应提高。然而,尽管载流子密度随着Sn掺杂而急剧增加,但是没有观察到铁磁性的明显变化。这可以通过修改的有界磁极化子模型来解释。

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