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Thermal nanoimprint lithography for drift correction in super-resolution fluorescence microscopy

机译:热纳米压印光刻技术用于超分辨率荧光显微镜中的漂移校正

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摘要

Localization-based super-resolution microscopy enables imaging of biological structures with sub-diffraction-limited accuracy, but generally requires extended acquisition time. Consequently, stage drift often limits the spatial precision. Previously, we reported a simple method to correct for this by creating an array of 1 μm3 fiducial markers, every ~8 μm, on the coverslip, using UV-nanoimprint lithography (UV-NIL). While this allowed reliable and accurate 3D drift correction, it suffered high autofluorescence background with shorter wavelength illumination, unstable adsorption to the substrate glass surface, and suboptimal biocompatibility. Here, we present an improved fiducial micro-pattern prepared by thermal nanoimprint lithography (T-NIL). The new pattern is made of a thermal plastic material with low fluorescence backgrounds across the wide excitation range, particularly in the blue-region; robust structural stability under cell culturing condition; and a high bio-compatibility in terms of cell viability and adhesion. We demonstrate drift precision to 1.5 nm for lateral (x, y) and 6.1 nm axial (z) axes every 0.2 seconds for a total of 1 min long image acquisition. As a proof of principle, we acquired 4-color wide-field fluorescence images of live mammalian cells; we also acquired super-resolution images of fixed hippocampal neurons, and super-resolution images of live glutamate receptors and postsynaptic density proteins.
机译:基于定位的超分辨率显微镜能够对亚衍射极限精度的生物结构进行成像,但通常需要延长采集时间。因此,舞台漂移通常会限制空间精度。以前,我们报告了一种简单的方法来校正此问题,方法是使用UV-纳米压印光刻(UV-NIL)在盖玻片上每1〜8μm创建一个1μm 3 基准标记的阵列。尽管这可以进行可靠,准确的3D漂移校正,但它遭受了高自发荧光背景,较短波长的照明,对基板玻璃表面的不稳定吸附以及生物相容性欠佳的问题。在这里,我们介绍通过热纳米压印光刻(T-NIL)制备的改进的基准微图案。新的图案由热塑性塑料制成,在宽激发范围内,尤其是在蓝色区域,荧光背景低。细胞培养条件下稳定的结构稳定性;在细胞活力和粘附性方面具有很高的生物相容性。我们展示了每0.2秒对横向(x,y)和6.1 nm轴向(z)轴的漂移精度为1.5 nm,总共可获得1分钟的长图像。作为原理的证明,我们获得了活的哺乳动物细胞的4色宽视场荧光图像。我们还获得了固定海马神经元的超分辨率图像,以及活的谷氨酸受体和突触后密度蛋白的超分辨率图像。

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