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Organic-on-silicon complementary metal–oxide–semiconductor colour image sensors

机译:硅上有机互补金属氧化物半导体彩色图像传感器

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摘要

Complementary metal–oxide–semiconductor (CMOS) colour image sensors are representative examples of light-detection devices. To achieve extremely high resolutions, the pixel sizes of the CMOS image sensors must be reduced to less than a micron, which in turn significantly limits the number of photons that can be captured by each pixel using silicon (Si)-based technology (i.e., this reduction in pixel size results in a loss of sensitivity). Here, we demonstrate a novel and efficient method of increasing the sensitivity and resolution of the CMOS image sensors by superposing an organic photodiode (OPD) onto a CMOS circuit with Si photodiodes, which consequently doubles the light-input surface area of each pixel. To realise this concept, we developed organic semiconductor materials with absorption properties selective to green light and successfully fabricated highly efficient green-light-sensitive OPDs without colour filters. We found that such a top light-receiving OPD, which is selective to specific green wavelengths, demonstrates great potential when combined with a newly designed Si-based CMOS circuit containing only blue and red colour filters. To demonstrate the effectiveness of this state-of-the-art hybrid colour image sensor, we acquired a real full-colour image using a camera that contained the organic-on-Si hybrid CMOS colour image sensor.
机译:互补金属氧化物半导体(CMOS)彩色图像传感器是光检测设备的代表示例。为了实现极高的分辨率,必须将CMOS图像传感器的像素尺寸减小到小于一微米,这反过来大大限制了使用基于硅(Si)的技术可以被每个像素捕获的光子数量(即像素尺寸的减小会导致灵敏度下降。在这里,我们展示了一种新颖有效的方法,可以通过将有机光电二极管(OPD)叠加到带有Si光电二极管的CMOS电路上来提高CMOS图像传感器的灵敏度和分辨率,从而使每个像素的光输入表面积增加一倍。为了实现这一概念,我们开发了具有对绿光有选择性的吸收特性的有机半导体材料,并成功地制造了没有滤色镜的高效绿光敏感型OPD。我们发现,这样的顶部受光OPD对特定的绿色波长具有选择性,当与新设计的仅包含蓝色和红色滤色镜的基于Si的CMOS电路结合使用时,具有巨大的潜力。为了证明这种最先进的混合彩色图像传感器的有效性,我们使用包含有机硅上混合CMOS彩色图像传感器的相机获取了真实的全彩色图像。

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